Publication list (2000-2007)
- N. Kumar, Y. Yang, W. Noh, G. S. Girolami and J. R. Abelson, Titanium diboride thin films by low-temperature chemical vapor deposition from the single source precursor Ti(BH4)(3)(1,2-dimethoxyethane), Chem. Mat. 19, 3802 (2007). DOI: 10.1021/cm070277z
- J. E. Gerbi and J. R. Abelson, Low Temperature Magnetron Sputter Deposition of Polycrystalline Silicon Thin Films Using High Flux Ion Bombardment, J. Appl. Phys. 101, 06358 (2007). DOI: 10.1063/1.2710301
- B. A. Sperling and J. R. Abelson, Kinetic roughening of amorphous silicon during hot-wire chemical vapor deposition at low temperature, J. Appl. Phys. 101, 024915 (2007). DOI: 10.1063/1.2424527
- Y. Yang, S. Jayaraman, B. S. Sperling, D.-Y. Kim, G. S. Girolami, and J. R. Abelson, In-situ spectroscopic ellipsometry of hafnium diboride thin films: Film characterization and in-situ growth studies, J. Vac. Sci. Tech. A 25, 200 (2007). DOI: 10.1116/1.2409939
- M.-H. Kwon, B.-S. Lee, S. N. Bogle, L. N. Nittala, J. R. Abelson, S. G. Bishop, S. Raoux, B.-K. Cheong, and K.-B. Kim, Nanometer-scale order in amorphous Ge2Sb2Te5 analyzed by fluctuation electron microscopy, Appl. Phys. Lett. 90, 021923 (2007). DOI: 10.1063/1.2430067
- A. Chatterjee, S. Jayaraman, J. E. Gerbi, N. Kumar, J. R. Abelson, P. Bellon, A. A. Polycarpou, J.-P. Chevalier, Tribological behavior of hafnium diboride thin films, Surface and Coatings Technology 201, 4317?4322 (2006). DOI: 10.1016/j.surfcoat.2006.08.086
- T. Nguyen-Tran, V. Suendo, P. Roca i Cabarrocas, L. Nittala, S. N. Bogle and J. R. Abelson, Fluctuation microscopy evidence for enhanced nanoscale structural order in polymorphous silicon thin films, J. Appl. Phys. 100, 094319 (2006). DOI: 10.1063/1.2360381
- Ho-Ki Lyeo, David G. Cahill, Min-Ho Kwon, Bong-Sub Lee, John R. Abelson, Ki-Bum Kim, Stephen G. Bishop, and Byung-ki Cheong, Thermal Conductivity of Phase-Change Material Ge2Sb2Te5, Appl. Phys. Lett. 89, 151904 (2006). DOI: 10.1063/1.2359354
- Y. Yang, S. Jayaraman, D.-Y. Kim, G. S. Girolami, and J. R. Abelson, CVD Growth Kinetics of HfB2 Thin Films from the Single Source Precursor Hf(BH4)4, Chem. Mater. 18, 5088 (2006). DOI: 10.1021/cm0605421
- Y. Yang, S. Jayaraman, D.-Y. Kim, G. S. Girolami, and J. R. Abelson, Crystalline Texture in Hafnium Diboride Thin Films Grown by Chemical Vapor Deposition, J. Cryst. Growth 294, 389 (2006). DOI: 10.1016/j.jcrysgro.2006.05.035
- S. Jayaraman, J. E. Gerbi, Y. Yang, D. Y. Kim, A. Chatterjee, P. Bellon, G. S. Girolami, J.-P. Chevalier, J. R. Abelson, HfB2 and Hf-B-N Hard Coatings by Chemical Vapor Deposition, Surface and Coatings Technology 200(22-23), 6629-6633 (2006). DOI: 10.1016/j.surfcoat.2005.11.040
- L. N. Nittala, S. Jayaraman, B. A. Sperling, and J. R. Abelson, Hydrogen-induced modification of the medium range structural order in amorphous silicon films, Appl. Phys. Lett. 87(24), 241915 (2005). DOI: 10.1063/1.2143124
- S. Jayaraman, E. J. Klein, Y. Yang, D.-Y. Kim, G. S. Girolami, and J. R. Abelson, Chromium Diboride Thin Films by Low Temperature Chemical Vapor Deposition, J. Vac. Sci. Tech. A 23(4), 631-633 (2005). DOI: 10.1116/1.1927534
- S. Jayaraman, Y. Yang, D.-Y. Kim, G. S. Girolami, and J. R. Abelson, Hafnium Diboride Thin Films by Chemical Vapor Deposition from a Single Source Precursor, J. Vac. Sci. Tech. A 23, 1619 (2005). DOI: 10.1116/1.2049307
- B.-S. Lee, J. R. Abelson, S. G. Bishop, D.-H. Kang, B.-K. Cheong, and K.-B. Kim, Investigation of the optical and electronic properties of Ge2Sb2Te5 phase change material in its amorphous, cubic, and hexagonal phases, J. Appl. Phys. 97, 093509 (2005). DOI: 10.1063/1.1884248
- B. A. Sperling and J. R. Abelson Simultaneous short-range smoothening and global roughening during growth of hydrogenated amorphous silicon films, Appl. Phys. Lett. 85, 3456 (2004). DOI: 10.1063/1.1777414
- S. V. Khare, S. M. Nakhmanson, P. M. Voyles, P. Keblinski and J. R. Abelson, Evidence from atomistic simulations of fluctuation electron microscopy for preferred local orientations in amorphous silicon, Appl. Phys. Lett. 85, 745 (2004). DOI: 10.1063/1.1776614
- H.-C. Jin, J. R. Abelson, M. K. Erhardt, and R. G. Nuzzo, Fabrication of a-Si:H Photoconductive Image Sensor Arrays on Curved Substrates Using Soft Lithography, J. Vac. Sci. Tech. B 22(5), 2548-2551 (2004). DOI: 10.1116/1.1795249
- P. M. Voyles and J. R. Abelson, Medium-Range Order in Amorphous Silicon Measured by Fluctuation Electron Microscopy, Solar Energy Materials and Solar Cells 78, 85-113 (2003). DOI: 10.1016/S0927-0248(02)00434-8
- J. E. Gerbi, P. M. Voyles, M. M. J. Treacy, J. M. Gibson, and J. R. Abelson, Increasing Medium-Range Order in Amorphous Silicon Films with Low-Energy Ion Bombardment Appl. Phys. Lett. 82, 3665 (2003). DOI: 10.1063/1.1578164
- A. von Keudell and J. R. Abelson, Advantages of the Optical Cavity Substrate for Real Time Infrared Spectroscopy of Plasma-Surface Interactions, J. Appl. Phys. 91(8), 4840 (2002). 10.1063/1.1456963
- J. H. Sung, D. M. Goedde, G. S. Girolami, and J. R. Abelson, Remote Plasma CVD of Conformal ZrB2 Films at Low Temperature: A Promising Diffusion Barrier for ULSI Electronics, J. Appl. Phys. 91(6), 3904 (2002). DOI: 10.1063/1.1436296
- P. M. Voyles, J. E. Gerbi, M. M. J. Treacy, J. M. Gibson, and J. R. Abelson, Increased Medium-Range Order in Amorphous Silicon with Increased Substrate Temperature, J. Non-Cryst. Solids 293-295, 45-52 (2001). DOI: 10.1016/S0022-3093(01)00652-4
- M. Katiyar and J. R. Abelson, Investigation of Hydrogen Plasma Induced Phase Transition From a-Si:H to µc-Si:H Using Real Time Infrared Spectroscopy, Mat. Sci. and Eng. A 304-306, 349-52 (2001). DOI: 10.1016/S0921-5093(00)01528-8
- P. M. Voyles, J. E. Gerbi, M. M. J. Treacy, J. M. Gibson and J. R. Abelson, Absence of an Abrupt Phase Change in Silicon with Deposition Temperature, Phys. Rev. Lett. 86(24), 5514-17 (2001). DOI: 10.1103/PhysRevLett.86.5514
- A. Nuruddin and J. R. Abelson, Improved Transparent Conductive Oxide / p+ / i Junction in Amorphous Silicon Solar Cells by Tailored Hydrogen Flux During Growth, Thin Solid Films 394(1-2), 48-62 (2001). DOI: 10.1016/S0040-6090(01)01167-1
- M. K. Erhardt, H.-C. Jin, J. R. Abelson, and R. G. Nuzzo, Low Temperature Fabrication of Si Thin Film Transistor Microstructures by Soft Lithographic Patterning on Curved and Planar Substrates, Chemistry of Materials 12(11), 3306-15 (2000). DOI: 10.1021/cm000480t
- J. E. Gerbi and J. R. Abelson, The Deposition of Microcrystalline Silicon: Direct Evidence for Hydrogen-Induced Surface Mobility of Si Adspecies, J. Appl. Phys. 89(2), 1463 (2000). DOI: 10.1063/1.1334639
For a complete list of Prof. Abelson's publications please follow this link